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APPARATUS FOR COATING ELECTROMAGNETIC WAVE SHIELDING FILM CAPABLE OF PERFORMING BOTH MAGNETRON SPUTTERING COATING PROCESS AND THERMAL RESISTANT HEATING DEPOSITION PROCESS
APPARATUS FOR COATING ELECTROMAGNETIC WAVE SHIELDING FILM CAPABLE OF PERFORMING BOTH MAGNETRON SPUTTERING COATING PROCESS AND THERMAL RESISTANT HEATING DEPOSITION PROCESS
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机译:能够进行磁控溅射镀膜工艺和耐热加热沉积工艺的电磁波屏蔽膜的涂层装置
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摘要
PURPOSE: An apparatus is provided to reduce process time by performing both a magnetron sputtering coating process and a thermal resistant heating deposition process. CONSTITUTION: An apparatus comprises a chamber(100); a component support unit(110) fixed at the rear wall of the chamber, wherein the component support unit has a diameter smaller than the diameter of the chamber, and a cut-out plane(112) formed by cutting out a certain part of the outer surface of the component support unit; and a thermal resistant heater(150) mounted on the cut-out plane, and which evaporates coating materials by a thermal resistant heating. The thermal resistant heater includes a pair of boat supports(151) arranged on the cut-out plane; a boat portion(155) for containing a metal coating material to be evaporated by a thermal resistant heating; a support arm(153) extended from both sides of the boat portion, and which supports the boat portion; a boat fixing piece(152) mounted on the support arm; and a bolt(154) for fixing the support arm and the boat fixing piece at the boat support.
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