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Method for controlling a reactive high performance - pulse - magnetron sputtering process and apparatus for this purpose,
Method for controlling a reactive high performance - pulse - magnetron sputtering process and apparatus for this purpose,
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机译：为此目的控制反应性高性能-脉冲-磁控溅射工艺的方法和设备，
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摘要
Method for controlling a reactive high performance - pulse - sputtering process,in the case of which a control variable is measured and based on the measured controlled variable, a correcting variable is changed, the controlled variable to adjust to a predetermined desired value,characterized in thatas the manipulated variable is the discharge power is varied by the pulse frequency of the discharge, while maintaining the shape of the individual discharge pulses is varied.
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