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首页> 外文期刊>Nuclear Instruments & Methods in Physics Research. B, Beam Interactions with Materials and Atoms >Explanation of the enhancement of NiSi thermal stability according to TFD equations and Miedema's model
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Explanation of the enhancement of NiSi thermal stability according to TFD equations and Miedema's model

机译:根据TFD方程和Miedema模型解释NiSi热稳定性的提高

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摘要

A thin interlayer of Pt can greatly improve the thermal stability of NiSi films formed by rapid thermal annealing (RTA) on Si(111) substrates, as was revealed by X-ray diffraction (XRD) data, Micro-Raman analysis and sheet resistance measurement. Thomas-Fermi-Dirac (TFD) equations are combined with Miedema's Model to calculate the heat of formation of NiSi. The reduction in the heat of formation of NiSi induced by the Pt interlayer is proposed as a possible reason for the improved thermal stability of NiSi and the retarded transition to NiSi_2 during high temperature annealing.
机译:X射线衍射(XRD)数据,显微拉曼分析和薄层电阻测量表明,薄的Pt中间层可以极大地改善通过在Si(111)衬底上进行快速热退火(RTA)形成的NiSi膜的热稳定性。 。将Thomas-Fermi-Dirac(TFD)方程与Miedema模型结合起来,以计算NiSi的形成热。提出减少由Pt夹层引起的NiSi形成热是提高NiSi的热稳定性和在高温退火期间延迟过渡到NiSi_2的可能原因。

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