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Properties of Seamless W Sub-Micro Electrode Used for Phase Change Memory

         

摘要

In order to improve the reliability of C-RAM devices, a seamless sub-micro W heating electrode in diameter 260 nm is fabricated with standard 0.18 μm CMOS processing line. Then we successfully manufacture a chalcogenide random access memory device using this seamless sub-micro W heating electrode. The results show good electrical performance, e.g. the reset current of 1.3mA and the set/reset cycle up to 109 have been achieved.

著录项

  • 来源
    《中国物理快报:英文版》 |2008年第6期|2289-2291|共3页
  • 作者单位

    Laboratory of Nanotechnology, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050;

    Graduate School of the Chinese Academy of Sciences, Belting 100049;

    Laboratory of Nanotechnology, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050;

    Laboratory of Nanotechnology, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050;

    Laboratory of Nanotechnology, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050;

    Semiconductor Manufacture International Corporation Shanghai, 18 Zhangjiang Road, Shanghai 200050;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 物理学;
  • 关键词

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