首页> 中文期刊> 《中国物理快报:英文版》 >Enhancement-Mode AlGaN/GaN High Electron Mobility Transistors Using a Nano-Channel Array Structure

Enhancement-Mode AlGaN/GaN High Electron Mobility Transistors Using a Nano-Channel Array Structure

         

摘要

A nano-channel array(NCA)structure is applied to realize enhancement-mode(E-mode)AlGaN/GaN high-electron mobility transistors(HEMTs).The fabricated NCA-HEMT,consisting of 1000 channels connected in parallel with a channel width of 64 nm,shows a threshold voltage of 0.15 V and a subthreshold slope of 78 mV/dec,compared to−3.92 V and 99 mV/dec for a conventional HEMT(C-HEMT),respectively.Both the NCA-HEMT and C-HEMT show similar gate leakage current,indicating no significant degradation in gate leakage characteristics for the NCA-HEMT.The surrounding-field effect and relieved polarization contribute to the very large positive threshold voltage shift,while the work function difference makes it positive.

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