Dry laser cleaning(DLC)and laser shockwave cleaning(LSC)are used to remove the particulate contamination from SiO_(2) sol−gel optical films.The results show that the LSC with a shockwave initiated by plasma formation under a focused laser beam pulse offers much better efficiency than DLC.Silica particles up to 10µm on SiO_(2 )films can be removed without substrate damage at a gap distance of 0.5 mm,and a more uniform surface microstructure can be obtained after LSC.Furthermore,it is demonstrated that the transmittance of contaminated SiO2 films can be restored to the as-deposited value after the LSC on dispersed-particle zones.LSC has potential applications in engineering-oriented large components.
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